Ultrahigh vacuum sputtering system

We have an all-metal ultrahigh vacuum (UHV) deposition system which is equipped with six all-metal UHV sputtering sources. The base pressure of the system is in the mid-10^-10 Torr. Ultrahigh purity Ar with impurity level of the order of one part per billion achieved by a Matheson Purifilter is used for sputtering. An ion-etching gun and a multi-pockets e-beam evaporator will be added to the system in the near future.

Front view of the system


Side view of the system

Plasma