In the last several years, metal-oxides have become the basis for many revolutionary electronic devices because they exhibit a wide range of electronic properties that conventional metallic elements and covalent semiconductors do not possess. Metal-oxide films can be grown by physical vapor deposition, chemical vapor deposition, and chemical solution deposition techniques. One of the challenges in solution-based processes of complex functional metal-oxide films has been to produce high crystallinity epitaxial films and at the same time to obtain desired physical properties. In this talk, I will discuss our new solution route for the deposition of thin film electronic materials. This technique uses aqueous solutions in which metals are bound to water soluble polymers. The solution can be then applied to in a variety of ways to form films. Post-annealing the precursor coatings yields high quality and crack-free epitaxial films. We have made a wide range of stable solutions. The stoichiometry of complex compounds is readily controlled by simply mixing pre-designed solutions. Importantly, the physical properties of these epitaxial films are as good as the films prepared by other techniques. The successful growth of both simple and complex epitaxial metal-oxide films with desired structural and physical properties by polymer-assisted deposition (PAD) suggests that PAD is a feasible alternative approach to the synthesis of high quality electronic materials.