Physics Colloquium, April 26, 2005

COLLOQUIUM CANCELED -- DUE TO ILLNESS

Frances A. Houle

IBM Almaden Research Center

Photolithography is the core process for fabrication of integrated structures involving patterned layers. As the target feature sizes are reaching the 50 nm scale, chemically amplified photoresists are being pushed to the limits of their performance. Successful development and use of these materials for nanoscale photolithography requires a physically accurate understanding of how the imaging process works and the role the resist plays as an integral part of the optical system. In this talk current research into mechanisms of image formation and pattern development in photoresists is described. The implications of the underlying physics and chemistry for successful use of photolithography below 50 nm will be discussed.

3.30 p.m., Robert Smith Seminar Room 1080, PRB

Refreshments served at 3:00 p.m., Atrium, PRB