ENCOMM NanoSystems Laboratory (ENSL)

Helios NanoLab 600 FIB

Dual electron and Ion beam

•   Electron imaging (0.7 nm @ 15 kV)
•   Ion beam machining (5 nm @ 30 kV)

E-beam lithography

•   Nabity NPGS software

X-ray EDS spectrometer

• compositional analysis with resolution down to 30 nm

Platinum deposition

• Other materials are possible